Reticle defect printability: impact on yield and feedback to suppliers

Reticle defect printability: impact on yield and feedback to suppliers

Author(s):

Vinle, R. ( Cypress Semiconductor Inc. (USA) )

Klaum, A.D. ( KLA-Tencor Corp. (USA) )

Chmielewski, D. ( Cypress Semiconductor Inc. (USA) )

Lamantia, M.J. ( DuPont Photomasks, Inc. (USA) )

Woolery, D.M. ( Cypress Semiconductor Inc. (USA) )

Coburn, D.L.

Weins, C.P. ( DuPont Photomasks, Inc. (USA) )

2 more

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part One

Page(from):

271

Page(to):

282

Pages:

12

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012736
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2002 : 22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.011-2002.10.04

Similar Items:

1 Conference Proceedings Defect dispositioning in a reticle qualification process Hawkins,M.A., Klaum,A.D. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Printability of 1 x reticle defects for submicron design rules Schurz,D.L., Flack,W.W., Newman,G. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Reticle defect printability and photoresist modeling of contact structures Flack,W.W., Schurz,D.L., Lee,R.B., Ho,C. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Partitioning of photomask processes for defects: II. Howard, C.H., Lamantia, M.J. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Correlation of reticle defects detectability and repairs to ArF wafer printability for 0.13-μm design rule with binary OPC/SB mask Phan,K.A., Spence,C.A., Riddick,J., Chen,J.X., Lamantia,M., Villa,H.A. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Size matters:defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability Almog,E., Caldwell,R.F., Chang,F.-C., Chen,J.F., Farrar,N.R., Karklin,L., Laidig,T.L., Sabouri,S., Shen,W.P., Staud,W., … SPIE - The International Society for Optical Engineering
4 Conference Proceedings Defect printability study with programmed defects on halftone reticles Dettmann,W., Haffner,H., Heumann,J.P., Liebe,R., Ludwig,R., Moses,R. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Measuring and assessing printability of reticle pinhole defects Taylor, D., Vacca, A., Zurbrick, L.S., Broadbent, W.H., Fiekowsky, P. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Defect printability in CPL mask technology Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Conley, W., Litt, L.C., Wu, W., Montgomery, P., Roman, B.J., Kasprowicz, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Use of excimer laser test system for studying haze growth [5992-120] Gordon, J., Murray, B., Frisa, L. E., Nelson, E., Weins, C., Green, M., Lamantia, M. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Subhalf-micron mask defect detectability and printability at 1｡ﾟ reticle magnification Schurz,D.L., Flack,W.W., Newman,G. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Strain energy harvesting for wireless sensor networks Churchill, D.L., Hamel, M.J., Townsend, C.P., Arms, S.W. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12