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Advanced write tool effects on 100-nm-node OPC

Author(s):
Buck, P.D. ( DuPont Photomasks, Inc. (USA) )
Green, K.G.
Ibsen, K.B.
Nakagawa, K.H.
Hong, D. ( Cypress Semiconductor, Inc. (USA) )
Krishnan, P.
Coburn, D.
2 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part One
Page(from):
147
Page(to):
156
Pages:
10
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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