Development of dioptric projection lenses for DUV lithography (Invited Paper)

Development of dioptric projection lenses for DUV lithography (Invited Paper)

Author(s):

Ulrich, W. ( Carl Zeiss Semiconductor Manufacturing Technologies AG (Germany) )
Rostalski, H.-J.
Hudyma, R.M. ( Paragon Optics, Inc. (USA) )

Publication title:

International optical design conference 2002 : 3-5 June, 2002, Tucson, Arizona, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4832

Pub. Year:

2002

Page(from):

158

Page(to):

169

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446084 [0819446084]

Language:

English

Call no.:

P63600/4832

Type:

Conference Proceedings

Details

TDL ID:	ZA00012669
Series ID:	PA00000029
Conf. info. (Name):	International Optical Design Conference
Conf. info. (Number):	2002
Conf. info. (Venue):	Tucson, AZ, USA
Conf. info. (Date):	2002.06.03-2002.06.05

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