Measurement of lithographic overlay by light-scattering ellipsometry

Measurement of lithographic overlay by light-scattering ellipsometry

Author(s):: Germer, T.A. ( National Institute of Standards and Technology (USA) )
Publication title:: Surface scattering and diffraction for advanced metrology II : 9 July 2002 Seattle, Washington, USA
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 4780
Pub. Year:: 2002
Page(from):: 72
Page(to):: 79
Pages:: 8
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819445476 [0819445479]
Language:: English
Call no.:: P63600/4780
Type:: Conference Proceedings

Details

TDL ID:	ZA00012617
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Surface Scattering and Diffraction for Advanced Metrology
Conf. info. (Number):	2002 : 2nd
Conf. info. (Venue):	Seattle, WA, USA
Conf. info. (Date):	2002.07.09

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