Reflectometry-based approaches for in-situ monitoring of etch depths in plasma etching processes
- Author(s):
- Venugopal, V.C. ( Lam Research Corp. (USA) )
- Perry, A.J.
- Publication title:
- Advanced characterization techniques for optical, semiconductor, and data storage components : 9-11 July 2002 Seattle, Washington, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4779
- Pub. Year:
- 2002
- Page(from):
- 98
- Page(to):
- 106
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445469 [0819445460]
- Language:
- English
- Call no.:
- P63600/4779
- Type:
- Conference Proceedings
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