Measurement of the 100-nm NIST SRM 1963 by laser surface light scattering

Measurement of the 100-nm NIST SRM 1963 by laser surface light scattering

Author(s):

Germer, T.A. ( National Institute of Standards and Technology (USA) )
Mulholland, G.W.
Kim, J.H. ( National Institute of Standards and Technology (USA) )
Ehrman, S.H. ( Univ. of Maryland/College Park (USA) )

Publication title:

Advanced characterization techniques for optical, semiconductor, and data storage components : 9-11 July 2002 Seattle, Washington, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4779

Pub. Year:

2002

Page(from):

60

Page(to):

71

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445469 [0819445460]

Language:

English

Call no.:

P63600/4779

Type:

Conference Proceedings

Details

TDL ID:	ZA00012616
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components
Conf. info. (Number):	2002
Conf. info. (Venue):	Seattle, WA, USA
Conf. info. (Date):	2002.07.09-2002.07.11

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