OPC aware mask and wafer metrology
- Author(s):
Maurer, W. ( KLA-Tencor Corp. (USA) ) Wiaux, V. ( IMEC (Belgium) ) Jonckheere, R.M. Philipsen, V. Hoffmann, T. Verhaegen, S. Ronse, K.G. England, J.G. ( KLA-Tencor Corp. (USA) ) Howard, W.B. - Publication title:
- 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4764
- Pub. Year:
- 2002
- Page(from):
- 175
- Page(to):
- 181
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445315 [0819445312]
- Language:
- English
- Call no.:
- P63600/4764
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Feature proximity errors on mask: assessment results of commercially obtained reticles
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Implementation of 248-nm based CD metrology for advanced reticle production
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Reliable subnanometer repeatability for CD metrology in a reticle production environment
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning
SPIE - The International Society of Optical Engineering |