Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source
- Author(s):
Kwon, H.-J. ( PKL Corp. (Korea) ) Min, D.-S. Jang, P.-J. Chang, B.-S. Choi, B.-Y. Jeong, S.-H. - Publication title:
- 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4764
- Pub. Year:
- 2002
- Page(from):
- 60
- Page(to):
- 65
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445315 [0819445312]
- Language:
- English
- Call no.:
- P63600/4764
- Type:
- Conference Proceedings
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