Mask availability for next-generation lithography
- Author(s):
Lercel, M.J. ( Photronics, Inc. (USA) ) Fisch, E. ( IBM (USA) ) Racette, K.C. Lawliss, M. Williams, C. T. Kindt, L. Huang, C. - Publication title:
- 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4764
- Pub. Year:
- 2002
- Page(from):
- 18
- Page(to):
- 22
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445315 [0819445312]
- Language:
- English
- Call no.:
- P63600/4764
- Type:
- Conference Proceedings
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