Mask strategy at International SEMATECH (Keynote Paper)

Mask strategy at International SEMATECH (Keynote Paper)

Author(s):: Kimmel, K.R. ( International SEMATECH (USA) )
Publication title:: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 4764
Pub. Year:: 2002
Page(from):: 1
Page(to):: 8
Pages:: 8
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819445315 [0819445312]
Language:: English
Call no.:: P63600/4764
Type:: Conference Proceedings

Details

TDL ID:	ZA00012602
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2002 : 18th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2002.01.15-2002.01.16

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