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Pattern printability for reflectance degradation of Mo/Si mask blanks in EUV lithography

Author(s):
Sugawara, M. ( Association of Super-Advanced Electronics Technologies (Japan) )
Ito, M.
Chiba, A.
Hoshino, E.
Yamanashi, H.
Hoko, H.
Ogawa, T.
Lee, B. T.
Yoneda, T.
Takahashi, M.
Nishiyama, I.
Okazaki, S.
7 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
880
Page(to):
889
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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