New mask format low-energy electron-beam proximity projection lithography
- Author(s):
- Koike, K. ( Sony Corp. (Japan) )
- Omori, S.
- Iwase, K.
- Ashida, I.
- Moriya, S.
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 837
- Page(to):
- 846
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Imaging capability of low-energy electron-beam proximity projection lithography toward the 70-nm node
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
LEEPL (low-energy electron beam proximity-projection lithography) overlay status
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Feedforward correction of mask image placement for proximity electron lithography
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Litho-and-mask concurrent approach to the critical issues for proximity electron lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Evaluation of aperture mask degradation in electron-beam lithography using line edge roughness of resist patterns
SPIE-The International Society for Optical Engineering |