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Raster scan patterning solution for 100-and 70-nm OPC masks

Author(s):
Abboud, F.E. ( Etec Systems, Inc. (USA) )
Baik, K.-H.
Chakarian, V.
Cole, D. M.
Dean, R.L.
Gesley M.A.
Gillman. H.
Moore, W.C.
Mueller, M.
Naber, R.J.
Newman, T.H.
Puri, R.
Raymond, F., III
Rougieri, M.
9 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
705
Page(to):
716
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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