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Comparsion and correlation of VSS simulation results using images from different inspection systems

Author(s):
Hung, K. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Lin, D.
Chou, R.L.
Yang, S.C.
Lee, D.
Tseng, A.
Unno, H.
Chen, J.-H. ( Numerical Technologies, Inc. (USA) )
Huang, J. H.
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
666
Page(to):
672
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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