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Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Author(s):
Zurbrick, L.S. ( KLA-Tencor Corp. (USA) )
Heumann, J.P. ( Infineon Technologies AG (Germany) )
Rudzinski, M.W. ( KLA-Tencor Corp. (USA) )
Stokowski, S.E.
Urbach, J.-P ( Infineon Technologies AG (Germany) )
Wang, L. ( KLA-Tencor Corp. (USA) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
511
Page(to):
516
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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