New energy flux method for inspection of contact layer reticles
- Author(s):
- Volk, W.W. ( KLA-Tencor Corp. (USA) )
- Garcia, H.I.
- Becker, C.
- Chen, G.
- Watson, S.G.
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 499
- Page(to):
- 510
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Energy flux method for die-to-database inspection of critical layer reticles
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
New die-to-database inspection algorithm for inspection of 90-nm node reticles
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Investigation of smart inspection of critical layer reticles using additional designer data to determine defect significance
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Extending TeraStar reticle inspection capability to the 90nm node through layer-specific algorithms
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |