Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results
- Author(s):
Griesinger, U.A. ( Infineon Technologies AG (Germany) ) Dettmann, W. Hennig, M. Heumann, J.P. Koehle, R. Ludwig, R. Verbeek, M. Zarrabian, M. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 410
- Page(to):
- 421
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
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