Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology
- Author(s):
Hsu, S. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. Shi, X. Chen, J.F. Knose, W.T. Corcoran, N.P. Vedula, S. ( KLA-Tencor Corp.(USA) ) MacNaughton, C.W. Richie, M. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 373
- Page(to):
- 383
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
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