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CAR dry etching technology to produce 0.13-μm reticle

Author(s):
Chou, W.-Z. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Tsai, F.-G.
Tuo, C.C.
Yoo, C.S.
Tsai, T.S.
Shue, L.
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
323
Page(to):
331
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

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