Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures
- Author(s):
Choi, S.-J. ( PKL (Korea) ) Cha, H.-S. Yoon, S.-Y. Kim, Y.-D. Lee, D.-H. Kim, J.-M. Kim, J.-S. Min, D.-S. Jang, P.-J. Chang, B.-S. Kwon, H.-J. Choi, B.-Y. Choi, S.-S. Jeong, S.H. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 303
- Page(to):
- 311
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
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