Enriching design intent for optimal OPC and RET
- Author(s):
- Rieger, M.L. ( Avant! Corp. (USA) )
- Gravoulet, V.
- Mayhew, J.P.
- Beale, D.F.
- Lugg, R.M.
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4754
- Pub. Year:
- 2002
- Page(from):
- 132
- Page(to):
- 137
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- Language:
- English
- Call no.:
- P63600/4754
- Type:
- Conference Proceedings
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