Blank Cover Image

157-nm lithography program at International SEMATECH (Invited Paper)

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4754
Pub. Year:
2002
Page(from):
26
Page(to):
32
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
Language:
English
Call no.:
P63600/4754
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings NGL process and the role of International SEMATECH (Invited Paper)

Dao, G.T., Mackay, R.S., Seidel, P.K.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Does technology acceleration equate to mask cost acceleration? (Invited Paper)

Trybula, W.J., Grenon, B.J.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings 157-nm lithography for 100-nm generation and beyond: progress and status

Dao,G.T., Borodovsky,Y.A.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings 248-nm DUV MoSiON embedded phase-shifting mask for 0.25-µm lithography

G.T. Dao, G. Liu, R.F. Hainsey, J.N. Farnsworth, Y. Tokoro

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Mechanical analysis of hard pellicles for 157-nm lithography

Reu,P.L., Mikkelson,A.R., Schlax,M.P., Cotte,E.P., Siewert,L.K., Engelstad,R.L., Lovell,E.G., Dao,G.T., Zheng,J.-F.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask

Dao,G.T., Liu,G., Snyder,A., Farnsworth,J.N.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application

Zheng,J.-F., Kuse,R., Ramamoorthy,A., Dao,G.T., Lo,F.-C.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH

Meute, J., Rich, G.K., Hien, S., Dean, K.R., Gondran, C., Cashmore, J.S., Ashworth, D., Webb, J.E., Rich, L.R., Dewa, …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Progress in 157-nm lithography development at Intel:resists and reticles

Rao,V., Panning,E.M., Liao,L., Hutchinson,J.M., Grenville,A., Holl,S.M., Bruner,D., Balasubramanian,R., Kuse,R., …

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Mask requirements for advanced lithography

Trybula,W.J., Engelstad,R.L.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Challenges of image placement and overlay at the 90-nm and 65-nm nodes

Trybula, W.J.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Technology acceleration: the change in industry requirements

Trybula, W.J.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12