Blank Cover Image

Characterizing the process window of a double-exposure dark-field alternating phase-shift mask

Author(s):
Mack, C.A. ( KLA-Tencor Corp.(USA) )  
Publication title:
Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4692
Pub. Year:
2002
Page(from):
454
Page(to):
464
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444394 [0819444391]
Language:
English
Call no.:
P63600/4692
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Design and analysis of manufacturable alternating phase-shifting masks

Gordon,R.L., Mack,C.A., Petersen,J.S.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings New double exposure technique using alternating phase-shifting mask with reversed phase

Hotta, S., Hayano, K., Kakuta, K., Hasegawa, N.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Phase-defocus windows for alternating phase-shifting mask

Liang, F. -J., Chen, C. -K., Shin, J. -J., You, J. -W., Lin, C. -H., Pan, Z. -Y., Shu, K. -C., Gau, T. -S., Lin, B. J.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Automated design of halftoned double-exposure phase-shifting masks

Y.-T. Wang, Y.C. Pati, H. Watanabe, T. Kailath

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Electron-beam lithography simulation for mask making:V. Impact of GHOST proximity effect correction on process window

Mack,C.A., Sauer,C.A.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Proximity effects in alternating aperture phase-shifting masks

Pierrat,C.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings New double exposure technique without alternating phase-shift mask

T. Yamamoto, T. Yao, H. Futatsuya, T. Chijimatsu, S. Asai

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Defect printability and repair of alternating phase-shift masks

Friedrich,C., Verbeek,M., Mader,L., Crell,C., Pforr,R., Griesinger,U.A.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Impact of illumination coherence and polarization on the imaging of attenuated phase-shift masks

Ma,Z.M., Mack,C.A.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Proximity effects of alternating phase-shift masks

Maurer,W., Friedrich,C., Mader,L., Thiele,J.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node

Lai, K., Gallatin, G.M., Rosenbluth, A.E., Fonseca, C.A., Liebmann, L.W., Progler, C.J.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Characterizing the demons in high-NA phase-shifting masks

Robins, G. C., Neureuther, A. R.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12