Enabling the 70-nm technology nobe with 193-nm altPSM lithography(Invited Paper)
- Author(s):
Liebmann, L.W. ( IBM Microelectronics Div.(USA) ) Lund, J. Graur, I.C. Heng, F.-L. Fonseca, C.A. Culp, J. Gabor, A.H. - Publication title:
- Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4692
- Pub. Year:
- 2002
- Page(from):
- 262
- Page(to):
- 273
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444394 [0819444391]
- Language:
- English
- Call no.:
- P63600/4692
- Type:
- Conference Proceedings
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