2001 metrology roadmap: process control through amplification and averaging microscopic changes (Invited Paper)

2001 metrology roadmap: process control through amplification and averaging microscopic changes (Invited Paper)

Author(s):: Diebold, A.C. ( International SEMATECH(USA) )
Publication title:: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 4692
Pub. Year:: 2002
Page(from):: 29
Page(to):: 37
Pages:: 9
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819444394 [0819444391]
Language:: English
Call no.:: P63600/4692
Type:: Conference Proceedings

Details

TDL ID:	ZA00012527
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Design, process integration, and characterization for microelectronics
Conf. info. (Number):	2002
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.06-2002.03.07

Similar Items:

1 Conference Proceedings INVITED: METROLOGY FOR DEVELOPMENT AND MANUFACTURE OF PRESENT AND FUTURE GENERATIONS OF INTEGRATED CIRCUITS Diebold, A.C. Electrochemical Society	7 Conference Proceedings INTRODUCTORY REMARKS - INTEGRATED METROLOGY AND DIAGNOSTICS Diebold, A.C., Koyama, H. Electrochemical Society
2 Conference Proceedings 1999 ITRS metrology roadmap and its implications for lithography Diebold,A.C., Joy,D.C. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Micromirrors: overview and application roadmap (Invited Paper) Bouchaud, J., Bahle, C., Wicht, H. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Semiconductor Metrology Requirements over the Next 15 Years Diebold, A.C. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Parametric amplification and processing of optical signals (Invited Paper) [6019-108] McKinstrie C. J., Su Y. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Semiconductor Metrology Requirements over the Next 15 Years Diebold, A.C. Electrochemical Society	10 Conference Proceedings Applications of image diagnostics to metrology quality assurance and process control Allgair, J.A., Boksha, V.V., Bunday, B.D., Diebold, A.C., Cole, D.C., Davidson, M.P., Hutcheson, J.D., Gurnell, A.W., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Metrology (including materials characterization) for nano-electronics (Keynote Paper) [6175-01] Diebold, A. C., Price, J., Hung, P. Y. SPIE - The International Society of Optical Engineering	11 Conference Proceedings From compliance to control: off-roadmap metrology for low-k1 lithography Ausschnitt,C.P. SPIE-The International Society for Optical Engineering
6 Conference Proceedings INTRODUCTORY REMARKS - INTEGRATED METROLOGY AND DIAGNOSTICS Diebold, A.C., Koyama, H. Electrochemical Society	12 Conference Proceedings Advances in interferometric metrology (Invited Paper) Wyant, J.C. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12