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Contact hole photo process improvement by multiple exposures with matched illumination settings

Author(s):
Yen, Y.-S. ( United Microelectronics Corp. (Taiwan) )
Huang, I-H.
Hwang, J.-R.
Hung, K.-C.
Ku, C.-F.
Chang, C.-H.
Fang, C.-Y.
Yen, P.W.
3 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1530
Page(to):
1536
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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