Model-based OPC for 0.13-μm contacts using 248-nm Att PSM
- Author(s):
Shin, J.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. ) Wu, T.C. Chen, C.-K. Liu, R.-G. Ku, Y.C. Lin, B.J. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1296
- Page(to):
- 1307
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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