Blank Cover Image

Accuracy of new analytical models for resist formation lithography

Author(s):
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1254
Page(to):
1265
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Application of lithography simulation in reticle inspection

Kalus, C.K., Wildfeuer, R.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings FIRM:a new software tool for calibration of lithography simulation

Kruger,D., Kalus,C.K., Erdmann,A., Friedrich,C., Kasmaier,R., Feike,A.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Modification of boundaries conditions in the FDTD algorithm for EUV mask modeling

Vial, A., Erdmann, A., Schmoeller, T., Kalus, C.K.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Improved notch moedl for resist dissolution in lithography simulation

Robertson,S.A., Pavelchek,E.K., Hoppe,W., Wildfeuer,R.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques

Erdmann, A., Kalus, C.K., Schmoeller, T., Wolter, A.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Chemically amplified deep UV resists for electron-beam lithography applications

Chen,H.L., Hsu,C.K., Chen,B.C., Ko,F.H., Yang,J.Y., Huang,T.Y., Chu,T.C.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Three dimensional mask effects in OPC process model development from first principles simulation

L. S. Melvin Ill, T. Schmoeller, C. K. Kalus, J. Li

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Organoelement resists for EUV lithography

Dai, J., Ober, C.K., Wang, L., Cerrina, F., Nealey, P.F.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Rigorous simulation of exposure over nonplanar wafers

Erdmann, A., Kalus, C.K., Schmoeller, T., Klyonova, Y., Sato, T., Endo, A., Shibata, T., Kobayashi, Y.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Novel resists with nontraditional compositions for EUV lithography

Dai, J., Ober, C.K.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Rigorous simulation of defective EUV multilayer masks

Sambale, C., Schmoeller, T., Erdmann, A., Evanschitzky, P., Kalus, C.K.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Fluoropolymer resists for 157 nm lithography

Vohra, V.R., Liu, X.-Q., Douki, K., Ober, C.K., Conley, W., Zimmerman, P., Miller, D.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12