Model-based OPC considering process window aspects: a study
- Author(s):
Schulze, S.F. ( Infineon Technologies Corp. (USA) ) Park, O. Zimmermann, R. ( Infineon Technologies AG (Germany) ) Chen, M.-J. ( United Microelectronics Corp. (USA) ) LaCour, P. ( Mentor Graphics Corp. (USA) ) Sahouria, E.Y. Granik, Y. Cobb, N. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1097
- Page(to):
- 1105
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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