193-nm lithography and resist reflow for the BEOL

193-nm lithography and resist reflow for the BEOL

Author(s):: DellaGuardia, R. ( IBM Corp. (USA) )
Publication title:: Optical Microlithography XV
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 4691
Pub. Year:: 2002
Vol.:: Part Two
Page(from):: 853
Page(to):: 860
Pages:: 8
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819444370 [0819444375]
Language:: English
Call no.:: P63600/4691
Type:: Conference Proceedings

Details

TDL ID:	ZA00012526
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

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