Analysis of wafer flatness for CD control in photolithography
- Author(s):
Fujisawa, T. ( Toshiba Corp. (Japan) ) Asano, M. Sutani, T. Inoue, S. Yamada, H. Sugamoto, J. Okumura, K. ( Univ. of Tokyo (Japan) ) Hagiwara, T. ( Nikon Corp. (Japan) ) Oka, S. ( Shin-Etsu Handotai Co., Ltd. (Japan) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 802
- Page(to):
- 809
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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