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157-nm lithography with high numerical aperture lens for 70-nm technology node

Author(s):
Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kanda, N.
Kim, J.-H.
Yamabe, O.
Watanabe, K.
Furukawa, T.
Miyoshi, S.
Itani, T.
Cashmore, J.S. ( Exitech Ltd. (UK) )
Gower, M.C.
5 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
584
Page(to):
593
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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