Attenuating phase-shifting mask at 157 nm
- Author(s):
Liberman, V. ( MIT Lincoln Lab. (USA) ) Rothschild, M. Spector, S.J. Krohn, K.E. Cann, S.C. Hien, S. ( Infineon Technologies Corp. (USA) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 561
- Page(to):
- 567
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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