Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
- Author(s):
Petersen, J.S. ( Petersen Advanced Lithography, Inc (USA) ) Conley, W. ( Motorola (USA) ) Roman, B.J. Litt, L.C. Lucas, K. Wu, W. Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Chen, J.F. Laidig, T.L. Wampler, K.E. Gerold, D.J. ( Petersen Advanced Lithography, Inc. (USA) ) Socha, R.J. ( ASML (USA) ) van Praagh, J. ( ASML (Netherlands) ) Droste, R. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 515
- Page(to):
- 529
- Pages:
- 15
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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