Solutions for printing sub-100-nm contacts with ArF
- Author(s):
Graeupner, P. ( Carl Zeiss (Germany) ) Goehnermeier, A. Lowisch, M. Garreis, R.B. Flagello,D.G. ( ASML (USA) ) Hansen, S.G. Socha, R.J. Koehler, C. ( ASML (Netherlands) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 503
- Page(to):
- 514
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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