Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
- Author(s):
Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Corcoran, N.P. Eurlings, M. ( ASML (Netherlands) ) Knose, W.T. ( ASML MaskTools, Inc. (USA) ) Laidig, T.L. Wampler, K.E. Roy, S. Shi, X. Hsu, C.M. Chen, J.F. Finders, J. ( ASML (Netherlands) ) Socha, R.J. ( ASML (USA) ) Dusa, M.V. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 476
- Page(to):
- 490
- Pages:
- 15
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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