Model-based design improvements for the 100-nm lithography generation
- Author(s):
Lucas, K. ( Motorola (USA) ) Postnikov, S.V. Patterson, K. Yuan, C.-M. Thomas, C. Thompson, M.A. Carter, R. Litt, L.C. Montgomery, P.K. ( Motorola (USA) ) Wimmer, K. ( Motorola (USA) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 215
- Page(to):
- 226
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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