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Introduction of full-level alternating phase-shift mask technology into IC manufacturing

Author(s):
Thiele, J. ( Infineon Technologies AG (Germany) )
Ahrens, M.
Dettmann, W.
Heissmeier, M.
Hennig, M.
Ludwig, B.
Moukara, M.
Pforr, R.
3 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
89
Page(to):
97
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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