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Is model-based optical proximity correction ready for manufacturing? Study on 0.12- and 0.175-μm DRAM technology

Author(s):
Cui, Y. ( IBM Microelectronics (USA) )
Zach, F.X.
Butt, S. ( Infineon Technologies Corp. (USA) )
Li, W.-K. ( IBM Microelectronics (USA) )
Liegl, B. ( Infineon Technologies Corp. (USA) )
Liebmann, L.W. ( IBM Microelectronics (USA) )
1 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
67
Page(to):
75
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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