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Optimization of organic bottom antireflective coatings' compatibility with ArF resists

Author(s):
Xiang, Z. ( Clariant Corp. (USA) )
Shan, J.
Gonzalez, E.
Wu, H.
Ding, S.
Neisser, M.
Ho, B.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, H.
3 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1102
Page(to):
1111
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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