Generation mechanism of surface roughness in resists: free volume effect on surface roughness

Generation mechanism of surface roughness in resists: free volume effect on surface roughness

Author(s):

Yamaguchi, T. ( NTT Basic Research Labs. (Japan) )
Namatsu, H.

Publication title:

Advances in Resist Technology and Processing XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4690

Pub. Year:

2002

Vol.:

Part Two

Page(from):

921

Page(to):

928

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

Language:

English

Call no.:

P63600/4690

Type:

Conference Proceedings

Details

TDL ID:	ZA00012524
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2002 : 19th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.04-2002.03.06

Similar Items:

1 Conference Proceedings Molecular weight effect on line-edge roughness Yamaguchi, T., Yamazaki, K., Namatsu, H. SPIE-The International Society for Optical Engineering	7 Conference Proceedings New development model: aggregate extraction development Yamaguchi,T., Namatsu,H., Nagase,M., Yamazaki,K., Kurihara,K. SPIE-The International Society for Optical Engineering
2 Conference Proceedings *Resist materials providing small line-edge roughness Namatsu, Hideo, Yamaguchi, Toru, Kurihara, Kenji MRS-Materials Research Society	8 Conference Proceedings Nanoline Formation by Using Small-Aggregate Resist and Supercritical Resist Drying Namatsu, Hideo Materials Research Society
3 Conference Proceedings Line-edge roughness characterized by polymer aggregates in photoresists Yamaguchi, T., Namatsu, H., Nagase, M., Kurihara, K., Kawai, Y. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Surface and line-edge roughness in acid-breakable resin-based positive resist Sakamizu, T., Shiraishi, H. SPIE-The International Society for Optical Engineering
4 Conference Proceedings New supercritical resist dryer Namatsu, H. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Mechanism of post develop stain defect and resist surface condition M. Harumoto, A. Yamaguchi, A. Hisai SPIE - The International Society of Optical Engineering
5 Conference Proceedings Spin-coatable Al2O3 resists in electron-beam nanolithography Saifullah, M. S. M., Namatsu, H., Yamaguchi, T., Yamazaki, K., Kurihara, K. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Microswelling-free negative resists for ArF excimer laser lithography utilizing acid-catalyzed intramolecular esterification Hattori, T., Tsuchiya, Y., Yokoyama, Y., Oizumi, H., Morisawa, T., Yamaguchi, A., Shiraishi, H. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance Yamaguchi, A., Tsuchiya, R., Fukuda, H., Komuro, O., Kawada, H., Iizumi, T. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Rapid supercritical drying techniques for advanced lithography Namatsu, H. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12