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Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248-nm chemically amplified resist

Author(s):
Kim, H.-J. ( DongJin Semichem Co., Ltd. (Korea) )
Chung, Y.-S.
Lee, D.-H.
Cho, S.-H.
Im, K.-H.
Yim, Y.-G.
Kim, D.-B.
Kim, J.Y.
3 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part Two
Page(from):
651
Page(to):
659
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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