Blank Cover Image

Contact hole patterning performance of ArF resist for 0.10μm technology node

Author(s):
Kim, J.-S. ( Hynix Semiconductor, Inc. (Korea) )
Jung, J.-C.
Kong, K.-K.
Lee, G.-S.
Lee, S.-K.
Hwang, Y.-S.
Shin, K.-S.
2 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part One
Page(from):
577
Page(to):
585
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

Similar Items:

Lee, S.-K., Jung, J.-C., Hwang, Y.-S., Park, K.-D., Kim, J.-S., Kong, K.-K., Shin, K.-S.

SPIE-The International Society for Optical Engineering

Oh, S. K., Kim, J. Y., Jung, Y. H., Lee, J. W., Kim, D. B., Kim, J., Lee, G. S., Lee, S. K., Ban, K. D., Jung, J. C., …

SPIE - The International Society of Optical Engineering

Hwang, Y.-S., Jung, J.-C., Park, K.-D., Lee, S.-K., Kim, J.-S., Kong, K.-K., Shin, K.-S., Ding, S.-J., Xiang, Z., …

SPIE-The International Society for Optical Engineering

Kim,B.-K., Lee,S.-J., Lee,D.-Y., Lee,J.-W., Nam,J.-L.

SPIE-The International Society for Optical Engineering

Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., …

SPIE-The International Society for Optical Engineering

Kim, J.-S., Jung, J.-C., Kong, K.-K., Kim, H.-R., Kim, H.-S.

SPIE-The International Society for Optical Engineering

Oh, S.-Y., Kim, W.-H., Yune, H.-S., Kim, H.-B., Kim, S.-M., Ahn, C.-N., Shin, K.-S.

SPIE-The International Society for Optical Engineering

Kim, J.-W., Son, E.-K., Lee, S.-H., Kim, D., Kim, J., Lee, G., Jung, J.C., Bok, C.K., Moon, S.C., Shin, K.S.

SPIE - The International Society of Optical Engineering

Yune,H.-S., Kim,H.-B., Kim,W.-H., Ahn,C.-N., Ham,Y.-M., Shin,K.-S.

SPIE-The International Society for Optical Engineering

11 Conference Proceedings ArF resist for contact hole application

Chen,K.-J.R., Lawaon,M.C., Hughes,T., Brunsvld,W.R., Varanasi,P.R., Keller,R., Jordhamo,G.M.

SPIE-The International Society for Optical Engineering

Chua, G.S., Lin, Q., Tay, C.J., Quan, C.

SPIE-The International Society for Optical Engineering

Wang,Y.-Y., Lin,H.-T., Yu,S.-S., Chen,C.-K., Ku,Y.-C., Yen,A., Lin,B.J.

SPIE-The International Society for Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12