Implementation of the ArF resists based on VEMA for sub-100-nm device
- Author(s):
Kim, H.-W. ( Samsung Electronics Co., Ltd. (Korea) ) Lee, S. Choi, S.-J. Lee, S.-H. Kang, Y. Woo, S.-G. Nam, D.S. Chae, Y.-S. Kim, J.S. Moon, J.-T. Kavanagh, R.J. ( Shipley Co. LLC (USA) ) Barclay, G.G. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 533
- Page(to):
- 540
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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