Fluorinated dissolution inhibitors for 157-nm lithography
- Author(s):
Hamad, A.H. ( Cornell Univ. (USA) ) Bae, Y.C. Liu, X.-Q. Ober, C.K. Houlihan, F.M. ( Agere Systems (USA) ) Dabbagh, G. Novembre, A.E. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 477
- Page(to):
- 485
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Design strategies for 157-nm single-layer photoresists lithographic evaluation of a poly(α-trifluoromethyl vinyl alcohol)copolymer
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Model study by FT-IR of the interaction of select cholate dissolution inhibitors with poly(norbornene-alt-maleic anhydride) and its derivatives
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Model study by FT-IR and 13C NMR of the interaction of poly(norbornene-alt-maleic anhydride)and its derivatives with select cholate dissolution inhibitors or …
SPIE - The International Society for Optical Engineering |