Mesoscale simulation of positive tone chemically amplified photoresists
- Author(s):
- Schmid, G.M. ( Univ. of Texas at Austin (USA) )
- Burns, S.D.
- Stewart, M.D.
- Willson, C.G.
- Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 381
- Page(to):
- 390
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Effect of humidity on deprotection kinetics in chemically amplified resists
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Positive- and negative-tone water-processable photoresists: a progress report
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Mesoscale modeling for SFIL simulating polymerization kinetics and densification
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |