Characterization of the polymer-developer interface in 193-nm photoresist polymers and formulations during dissolution
- Author(s):
- Wallow, T.I. ( IBM Almaden Research Ctr. (USA) )
- Chan, W. ( Northwestern Univ. (USA) )
- Hinsberg, W.D. ( IBM Almaden Research Ctr. (USA) )
- Lee, S.-W.
- Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 299
- Page(to):
- 312
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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