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Collapse behavior of single layer 193 and 157-nm resists: use of surfactants in the rinse to realize the sub-130-nm nodes

Author(s):
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part One
Page(from):
254
Page(to):
261
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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