Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)
- Author(s):
Lee, G. ( Hyundai Electronics Industries Co., Ltd. (Korea) ) Kong, K.-K. Jung, J.-C. Shin, K.-S. Kang, J.-H. ( DongJin Semichem Co., Ltd. (Korea) ) Kim, S.D. Choi, Y.-J. Choi, S.-J. Kim, D.-B. Kim, J.-H. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 136
- Page(to):
- 140
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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