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Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)

Author(s):
Lee, G. ( Hyundai Electronics Industries Co., Ltd. (Korea) )
Kong, K.-K.
Jung, J.-C.
Shin, K.-S.
Kang, J.-H. ( DongJin Semichem Co., Ltd. (Korea) )
Kim, S.D.
Choi, Y.-J.
Choi, S.-J.
Kim, D.-B.
Kim, J.-H.
5 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part One
Page(from):
136
Page(to):
140
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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