Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization
- Author(s):
Kodama, S. ( Asahi Glass Co., Ltd. (Japan) ) Kaneko, I. Takebe, Y. Okada, S. Kawaguchi, Y. Shida, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Ishikawa, S. Toriumi, M. Itani, T. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 76
- Page(to):
- 83
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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